YU Ping1,XIONG Kuang-wei1,QIU Dong-jiang2(1.Department of Physics,East China Jiaotong University,Nanchang,330013,China;2.Department of Physics,Zhejiang University,Hangzhou 310027,China)
Abstract：Zn1-xCoxO thin films were deposited on silicon and quartz substrates by low temperature epitaxy technique at 250,350 and 350 ℃ respectively.The microstructural characterizations were investigated,the results of X-ray diffraction(XRD) demonstrated that Zn
2008, Vol. 32 